Company Filing History:
Years Active: 2019
Title: Masahiro Sakashita: Innovator in CMP Polishing Technology
Introduction
Masahiro Sakashita is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. His work focuses on developing innovative solutions for polishing surfaces that contain cobalt and other metals.
Latest Patents
Sakashita holds a patent for a CMP polishing liquid and polishing method. This invention relates to a polishing liquid specifically designed for surfaces that have at least a cobalt-containing portion and a metal-containing portion that includes a metal other than cobalt. The CMP polishing liquid comprises polishing particles, a metal corrosion inhibitor, and water. It is characterized by a pH of 4.0 or less. Notably, when measuring the corrosion potential of cobalt and the other metal in the CMP polishing liquid, the absolute value of the corrosion potential difference is between 0 and 300 mV.
Career Highlights
Masahiro Sakashita is associated with Hitachi Chemical Company, Ltd., where he has been instrumental in advancing CMP technologies. His expertise in this area has led to the development of effective polishing solutions that enhance the performance and longevity of various materials.
Collaborations
Sakashita has worked alongside talented colleagues, including Naomi Watanabe and Masayuki Hanano. Their collaborative efforts have contributed to the success of various projects within the company.
Conclusion
Masahiro Sakashita's innovative work in CMP polishing technology exemplifies the importance of research and development in enhancing industrial processes. His contributions continue to impact the field positively.