Sakura, Japan

Masahiro Kobayashi

This inventor holds 1 USPTO granted patent. Top assignee: Toppan Holdings Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahiro Kobayashi. Retrieved from https://idiyas.com/inventor/masahiro-kobayashi-dhkv3f6l

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Masahiro Kobayashi

Introduction

Masahiro Kobayashi is a notable inventor based in Sakura, Japan. He has made significant contributions to the field of ink compositions and light conversion technologies. His work is characterized by a focus on enhancing the performance and efficiency of color filters.

Latest Patents

Kobayashi holds a patent for an innovative ink composition, which includes light-emitting nanocrystalline particles. This composition also features a photopolymerizable component that contains at least one photopolymerizable compound with a Hansen solubility parameter δp of 3.0 MPa or more. Additionally, it incorporates a phosphite compound with a specific partial structure, enhancing its functionality in various applications.

Career Highlights

Throughout his career, Masahiro Kobayashi has been associated with Toppan Holdings Inc., a leading company in the printing and information technology sectors. His expertise in developing advanced materials has positioned him as a key player in the industry.

Collaborations

Kobayashi has worked alongside talented colleagues, including Eiji Otsuki and Mariko Toshimitsu. Their collaborative efforts have contributed to the advancement of innovative technologies within their field.

Conclusion

Masahiro Kobayashi's contributions to ink composition and light conversion technologies highlight his role as an influential inventor. His patent and collaborative work continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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