Kobe, Japan

Masahiro Inui


Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015-2023

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3 patents (USPTO):Explore Patents

Title: Masahiro Inui: Innovator in Oxide Film Thickness Measurement

Introduction

Masahiro Inui is a notable inventor based in Kobe, Japan. He has made significant contributions to the field of measurement technology, particularly in the area of oxide film thickness measurement. With a total of 3 patents to his name, Inui's work has advanced the understanding and application of measurement devices in industrial settings.

Latest Patents

Inui's latest patents include an innovative oxide film thickness measurement device and method. This device is designed to store layer thickness conversion information that correlates layer thickness with emissivity. It measures the emitting light luminances of a steel sheet's surface at various wavelengths and calculates the emissivity at each wavelength. The calculated thickness is then extracted as a candidate value for the actual layer thickness when the calculated ratio falls within a preset extent. Another patent focuses on a similar device that measures oxide film thickness by utilizing emitting light luminance measurement parts to determine the layer thickness corresponding to the measured luminance.

Career Highlights

Throughout his career, Masahiro Inui has worked with prominent companies such as Kobe Steel, Ltd. and Kobelco Research Institute, Inc. His experience in these organizations has allowed him to develop and refine his innovative measurement technologies.

Collaborations

Inui has collaborated with notable coworkers, including Hiroyuki Takamatsu and Ryota Nakanishi. Their combined expertise has contributed to the successful development of measurement devices that enhance industrial processes.

Conclusion

Masahiro Inui's contributions to the field of oxide film thickness measurement demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of measurement technology, making him a significant figure in this area.

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