Matsuyama, Japan

Masahiro Hosoi

This inventor holds 1 USPTO granted patent. Top assignees: Sony Corporation, Teijin Chemicals Limited. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahiro Hosoi. Retrieved from https://idiyas.com/inventor/masahiro-hosoi-b5v8bugs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Masahiro Hosoi: Innovator in Optical Disk Technology

Introduction

Masahiro Hosoi is a notable inventor based in Matsuyama, Japan. He has made significant contributions to the field of optical disk technology, particularly through his innovative patent related to laminate rolls.

Latest Patents

Hosoi holds a patent for a laminate roll, which is a wound laminate obtained by laminating a plastic film composed of an aromatic polycarbonate that includes bisphenol A as an aromatic dihydroxy component. This laminate is combined with a protective film made of aromatic polyester, using an intervening adhesive with a weak adhesive strength ranging from 3-50 gf (0.0294-0.49 N). The resulting wound laminate serves as a transparent protective layer for optical disks, facilitating the fabrication of film surface side-incident optical disks. He has 1 patent to his name.

Career Highlights

Throughout his career, Masahiro Hosoi has worked with prominent companies such as Teijin Chemicals Limited and Sony Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in the realm of materials and optical technology.

Collaborations

Some of his notable coworkers include Kazuo Yahata and Junichi Shibata. Their collaboration has likely contributed to the advancements in the projects they have worked on together.

Conclusion

Masahiro Hosoi's contributions to optical disk technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the development of protective materials in the technology sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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