Kobe, Japan

Masahiro Hoshino


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Masahiro Hoshino: Innovator in Electrodeposition Coating Technology

Introduction

Masahiro Hoshino, an inventive spirit from Kobe, Japan, is recognized for his significant contribution to the field of electrodeposition coating. With a keen focus on enhancing the production processes of printed circuit boards, his innovative approach has led to one notable patent.

Latest Patents

Hoshino's patent, titled "Electrodeposition Coating Process of Photoresist for Printed Circuit," delves into a refined technique. This process entails the electrodeposition coating on a conductive surface using a photosensitive electrodeposition coating composition (A). Subsequently, it involves an additional electrodeposition coating on the resulting coated plate with another composition (B), primarily made of a water-soluble or water-dispersible resin that has a glass transition temperature (Tg) of no less than 20 degrees Celsius. This innovative methodology significantly enhances the efficiency and effectiveness of printed circuit board production.

Career Highlights

Masahiro Hoshino has built his professional career at esteemed organizations such as Kansai Paint Company, Ltd. and Mitsubishi Denki Kabushiki Kaisha. His work at these companies has allowed him to apply his innovative ideas in practical settings, further refining the technologies within the coatings industry.

Collaborations

During his career, Hoshino has collaborated with talented professionals like Isao Kobayashi and Kenji Seko. These partnerships have contributed to the development and implementation of advanced material technologies, enhancing the overall quality of their projects.

Conclusion

With his pioneering work in electrodeposition coating processes, Masahiro Hoshino stands out as an influential inventor in the realm of printed circuit board technology. His patent and collaborations reflect a commitment to innovation and excellence, inspiring future advancements in the field.

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