This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 834,513 Years Active: 2001
Title: Innovations of Masahiro Hashimoto
Introduction
Masahiro Hashimoto is a notable inventor based in Kitaibaragi, Japan. He has made significant contributions to the field of photosensitive resin compositions, which are essential in various technological applications.
Latest Patents
Hashimoto holds a patent for a photosensitive resin composition and a method of forming resist images. This invention involves a chemically amplified photosensitive resin composition that contains a first compound that generates an acid upon exposure to actinic rays. Additionally, it includes a second compound that alters solubility in an aqueous alkali solution through an acid-catalyzed reaction. The patent also describes a method for forming a resist pattern using this innovative composition.
Career Highlights
Throughout his career, Hashimoto has focused on advancing the technology surrounding photosensitive materials. His work has been instrumental in improving the efficiency and effectiveness of resist patterns used in various applications.
Collaborations
Hashimoto has collaborated with notable colleagues, including Koji Kato and Michiaki Hashimoto. These partnerships have contributed to the development and refinement of his innovative ideas.
Conclusion
Masahiro Hashimoto's contributions to the field of photosensitive resin compositions highlight his role as a significant inventor. His patent reflects a deep understanding of chemical processes and their applications in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile