Company Filing History:
Years Active: 2000
Title: Masahiko Uraguchi: Innovator in Film Patterning Technology
Introduction
Masahiko Uraguchi is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of film patterning technology, particularly through his innovative patent. His work is recognized for enhancing the efficiency of film patterning methods, which are crucial in various technological applications.
Latest Patents
Uraguchi holds a patent for a "Film patterning method utilizing post-development residue remover." This method involves a series of steps that utilize resist as a mask to form patterns on a substrate. The process includes coating a film on a substrate, exposing and developing the resist, and effectively removing any residue using an alkali aqueous solution. This innovation allows for the quick removal of unnecessary resist residue, streamlining the film patterning process.
Career Highlights
Masahiko Uraguchi is associated with Fujitsu Corporation, where he has contributed to advancements in technology through his inventive work. His career is marked by a commitment to improving film patterning techniques, which are essential in the manufacturing of electronic components.
Collaborations
Uraguchi has collaborated with notable colleagues, including Eiichi Hoshino and Toshikatsu Minagawa. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Masahiko Uraguchi's contributions to film patterning technology exemplify the impact of innovative thinking in the field. His patent not only enhances efficiency but also reflects the importance of collaboration in driving technological advancements.