Nagaokakyo, Japan

Masahiko Kimura

This inventor holds 1 USPTO granted patent. Top assignee: Murata Manufacturing Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahiko Kimura. Retrieved from https://idiyas.com/inventor/masahiko-kimura-ntkjevc2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Masahiko Kimura: Innovator in Semiconductor Technology

Introduction

Masahiko Kimura is a prominent inventor based in Nagaokakyo, Japan. He is known for his contributions to semiconductor technology, particularly in the development of innovative devices that enhance performance and efficiency.

Latest Patents

Kimura holds a patent for a semiconductor device and method of manufacturing a semiconductor device. This invention includes a substrate, a plurality of electrodes on the substrate, and an insulator with openings that expose at least one electrode. The insulator covers part of the electrodes, and a semiconductor sheet is placed on the insulator, allowing for effective functionality. He has 1 patent to his name.

Career Highlights

Masahiko Kimura has made significant strides in his career, working with Murata Manufacturing Co., Ltd. His expertise in semiconductor devices has positioned him as a key player in the industry, contributing to advancements that benefit various technological applications.

Collaborations

Throughout his career, Kimura has collaborated with notable colleagues, including Naruto Miyakawa and Shota Ushiba. These partnerships have fostered innovation and have been instrumental in the development of cutting-edge technologies.

Conclusion

Masahiko Kimura's work in semiconductor technology exemplifies the impact of innovation in modern electronics. His contributions continue to influence the field, showcasing the importance of research and development in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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