Kyoto, Japan

Masahiko Kato

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2014-2023

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6 patents (USPTO):Explore Patents

Title: Masahiko Kato: Innovator in Substrate Processing Technologies

Introduction

Masahiko Kato is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of six patents. His innovative work focuses on methods and apparatuses that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Kato's latest patents include a substrate processing method, a substrate processing apparatus, and a pre-drying processing liquid. The pre-drying processing liquid contains a sublimable substance that transitions to gas without becoming liquid, along with a solvent in which the sublimable substance dissolves. This liquid is applied to the front surface of a substrate with a formed pattern. After the solvent evaporates, a solidified body containing the sublimable substance is left on the substrate's surface. This solidified body is then sublimated and removed. His substrate processing method aims to dry a patterned substrate effectively, involving a liquid film formation step, a solidified film formation step, and a sublimation step to remove the solidified film.

Career Highlights

Throughout his career, Masahiko Kato has worked with notable companies such as Screen Holdings Co., Ltd. and Dainippon Screen Mfg. Co., Ltd. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

Kato has collaborated with esteemed colleagues, including Masayuki Otsuji and Hiroaki Takahashi. These partnerships have likely fostered innovation and advancements in their shared field of expertise.

Conclusion

Masahiko Kato's contributions to substrate processing technologies through his patents and collaborations highlight his role as a key innovator in this field. His work continues to influence advancements in substrate processing methods and apparatuses.

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