The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Jul. 07, 2022
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Masayuki Otsuji, Kyoto, JP;

Hiroaki Takahashi, Kyoto, JP;

Masahiko Kato, Kyoto, JP;

Yu Yamaguchi, Kyoto, JP;

Yuta Sasaki, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); H01L 21/02 (2006.01); B08B 3/08 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02101 (2013.01); B08B 3/08 (2013.01); B08B 7/0014 (2013.01); H01L 21/67034 (2013.01); H01L 21/68764 (2013.01);
Abstract

To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.


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