This inventor holds 1 USPTO granted patent. Top assignees: Kanto Chemical Co., Inc., Tokyo Shibaura Denki Kabushiki Kaisha. Active years: 1985.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 6 
1 out of 2,916 
Years Active: 1985
Title: Masahiko Igarashi: Innovator in Negative-Working Photoresist Coating Composition
Introduction
Masahiko Igarashi, a prominent inventor based in Soka, Japan, is recognized for his significant contribution to the field of photoresist technology. With one patent to his name, Igarashi has demonstrated a remarkable ability to innovate in materials science, particularly in the development of photoresist coatings that are essential for lithographic processes in the semiconductor industry.
Latest Patents
Igarashi's patented invention is a negative-working photoresist coating composition, which is noted for its improved resolution. The composition features a cyclized polyisoprene with a weight-average molecular weight ranging from 10,000 to 100,000, exhibiting a molecular weight distribution of not more than 1.9. Accompanied by an organic solvent and a bisazido compound used as a crosslinking agent, this formulation has the potential to enhance the precision and efficiency of microfabrication techniques.
Career Highlights
Throughout his career, Masahiko Igarashi has been associated with notable companies such as Kanto Chemical Co., Inc. and Tokyo Shibaura Denki Kabushiki Kaisha. His work in these organizations has contributed to advancements in chemical engineering and materials used in technology applications. Igarashi's expertise in developing novel materials has solidified his reputation within the scientific community.
Collaborations
In his endeavors, Igarashi has collaborated with esteemed colleagues, including Hatsuo Nakamura and Tiharu Kato. These collaborations have likely facilitated knowledge exchange and innovation, leading to further advancements in their respective fields.
Conclusion
Masahiko Igarashi's contributions to the development of a negative-working photoresist coating composition highlight the importance of innovation in the realm of semiconductor manufacturing. As technology continues to evolve, the impact of inventors like Igarashi is crucial in paving the way for future advancements in materials science and engineering. His work represents not only a personal achievement but also a significant step forward for the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile