Sagamihara, Japan

Masahide Okumura

This inventor holds 27 USPTO granted patents, primarily in Charged Particle Beam Technology. Top assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd., Nippon Telegraph and Telephone Corporation. Active years: 1977-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahide Okumura. Retrieved from https://idiyas.com/inventor/masahide-okumura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 85.2

Average Co-Inventor Count = 3.9

ph-index = 10

Forward Citations = 246(Granted Patents)


Location History:

  • Tokyo, JA (1977)
  • Hachioji, JA (1977 - 1978)
  • Hachioji, JP (1978)
  • Katsuta, JP (1978)
  • Sagamihara, JP (1984 - 2003)

Company Filing History:


Years Active: 1977-2003

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Areas of Expertise:
Charged Particle Beam Lithography
Electron Beam Exposure
Semiconductor Devices
Pattern Formation
Piezoelectric Actuator
Mark Position Detection
Field Emission Apparatus
Microprobe Technology
Scanning Electron Beam
High Voltage Power Source
D.C. Bias Control
Measurement Systems
27 patents (USPTO):Explore Patents

Title: The Innovative Journey of Masahide Okumura

Introduction: Masahide Okumura, situated in Sagamihara, Japan, is a distinguished inventor known for his contributions to semiconductor technology. With an impressive portfolio of 27 patents, Okumura has significantly impacted the field of charged particle beam lithography, enhancing the capabilities of pattern formation in semiconductors.

Latest Patents: Among his noteworthy inventions, Okumura has developed advanced charged particle beam lithography apparatuses designed for high-speed and high-accuracy exposure processes. These inventions involve utilizing multiple stencil masks fitted with transferal and transmission apertures, allowing for efficient pattern projection. By utilizing a beam deflection device, the electron beam can selectively pass through various apertures, enabling rapid and precise exposure across different stencil masks. This iterative process dramatically increases the projection speed of semiconductor patterns, showcasing Okumura’s innovative approach to lithography technology.

Career Highlights: Throughout his professional journey, Masahide Okumura has held significant roles within prominent organizations such as Hitachi, Ltd. and Hitachi Instrument Engineering Co., Ltd. His tenure at these companies has allowed him to collaborate with leading experts while contributing to groundbreaking innovations in semiconductor manufacturing.

Collaborations: Okumura’s work has often been associated with talented colleagues like Hidetoshi Satoh and Yoshinori Nakayama. These collaborations have fostered an environment of creativity and innovation, leading to several advancements in the field of charged particle beam lithography.

Conclusion: Masahide Okumura's contributions to the field of semiconductor technology through his 27 patents stand as a testament to his innovative spirit and dedication to advancing industry standards. His work continues to influence the landscape of semiconductor manufacturing, paving the way for future technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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