Masahide Matsubara

Title: Masahide Matsubara: Innovator in Etching Solutions

Introduction

Masahide Matsubara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of etching solutions, holding a total of 7 patents. His work focuses on developing innovative materials and methods that enhance the efficiency and effectiveness of etching processes.

Latest Patents

Matsubara's latest patents include an etching liquid for a film of multilayer structure containing copper and molybdenum layers. This invention relates to an etching solution designed for multilayer thin films, which includes an organic acid ion supply source, a copper ion supply source, and an ammonia and/or ammonium ion supply source. The etching solution is characterized by a pH value ranging from 5 to 8, providing a method for etching these complex structures. Another notable patent is a photoresist stripping agent composition. This composition allows for the easy removal of photoresist residues at low temperatures without corroding wiring materials, eliminating the need for organic solvents during rinsing.

Career Highlights

Throughout his career, Matsubara has worked with notable companies such as NSK Corporation and Mitsubishi Gas Chemical Company, Inc. His experience in these organizations has contributed to his expertise in developing advanced etching solutions.

Collaborations

Matsubara has collaborated with esteemed colleagues, including Akiyoshi Honda and Kunio Fukuda. These partnerships have fostered innovation and the exchange of ideas in the field of etching technologies.

Conclusion

Masahide Matsubara's contributions to the field of etching solutions demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of materials and processes that are essential for advancements in technology.