Location History:
- Yamanashi-ken, JP (1998)
- Nirasaki, JP (2014 - 2016)
Company Filing History:
Years Active: 1998-2016
Title: Masahide Itoh: Innovator in Gas Supply Technology
Introduction
Masahide Itoh is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of gas supply technology, holding a total of 4 patents. His work primarily focuses on enhancing the efficiency and effectiveness of gas supply units used in substrate processing.
Latest Patents
Itoh's latest patents include a gas supply unit designed for supplying gas into a processing chamber where substrates are processed. This innovative gas supply unit features multiple gas supply sources and a mixing line that combines various gases to create a gaseous mixture. Additionally, it includes numerous branch lines that distribute the gaseous mixture to different locations within the processing chamber. A notable aspect of this invention is the additional gas supply unit, which introduces a specified additional gas into the mixture flowing through at least one branch line. The unit is equipped with pressure gauges and valves to regulate gas flow rates, along with a pressure ratio controller that ensures the gaseous mixtures maintain a specified pressure ratio by adjusting the valves based on measurements from the pressure gauges.
Career Highlights
Masahide Itoh is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop and refine his innovative gas supply technologies, contributing to advancements in substrate processing.
Collaborations
Itoh has collaborated with notable coworkers, including Hisashi Gomi and Kenetsu Mizusawa. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Masahide Itoh's contributions to gas supply technology have positioned him as a key figure in the field. His innovative patents and collaborative efforts continue to drive advancements in substrate processing, showcasing his dedication to improving industry standards.