Masaharu Shiratani

Title: Masaharu Shiratani: Innovator in Plasma Processing Technology

Introduction

Masaharu Shiratani is a notable inventor based in Fukuoka, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a patent that enhances the efficiency of plasma processing apparatuses.

Latest Patents

Masaharu Shiratani holds a patent for a plasma processing apparatus, high-frequency power supply circuit, and impedance matching method. This invention provides a plasma processing apparatus designed to perform plasma processing on a substrate. The apparatus includes a processing container that accommodates the substrate, an electrode for applying high-frequency power to generate plasma, and a high-frequency power supply circuit that ensures effective power delivery. The circuit features a matching device that aligns the impedance of the power supply with that of the plasma, incorporating a negative impedance portion to optimize performance.

Career Highlights

Throughout his career, Masaharu Shiratani has worked with prominent organizations such as Tokyo Electron Limited and Kyushu University. His experience in these institutions has allowed him to refine his expertise in plasma technology and contribute to advancements in the field.

Collaborations

Masaharu Shiratani has collaborated with notable colleagues, including Kunihiro Kamataki and Kazunori Koga. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Masaharu Shiratani's contributions to plasma processing technology exemplify his dedication to innovation. His patent reflects a significant advancement in the field, showcasing his expertise and commitment to enhancing technological processes.