Company Filing History:
Years Active: 1998-2002
Title: Masaharu Kobayashi: Innovator in Semiconductor Manufacturing
Introduction
Masaharu Kobayashi is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his innovative methods.
Latest Patents
Kobayashi's latest patents focus on the manufacture of semiconductor devices using anti-reflection coatings. The first patent describes a method that includes forming a transparent oxide film on a light reflecting surface, followed by the application of an anti-reflective a-c film. This process allows for the coating of a photoresist film, which is then patterned. The thicknesses of the films are carefully selected to achieve a standing wave intensity of 0.2 or smaller, enabling the formation of fine patterns on highly reflective substrates with minimal size variation and high precision. The second patent outlines a similar method, emphasizing the importance of the thicknesses of the anti-reflective and transparent films in achieving optimal results.
Career Highlights
Kobayashi is currently associated with Fujitsu Corporation, where he continues to advance semiconductor technology. His work has been instrumental in enhancing the precision and efficiency of semiconductor device manufacturing.
Collaborations
Kobayashi has collaborated with notable colleagues such as Eiichi Kawamura and Teruyoshi Yao, contributing to the development of innovative solutions in the semiconductor industry.
Conclusion
Masaharu Kobayashi's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in technology and precision manufacturing.