This inventor holds 2 USPTO granted patents and 3 EPO patents. Top assignees: Dai Nippon Printing Co., Ltd., Nabtesco Corporation. Active years: 2015-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015-2016
Title: Masafumi Sato: Innovator in Foreign Matter Removal Technology
Introduction
Masafumi Sato is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of foreign matter removal technology, holding a total of 2 patents. His innovative designs focus on enhancing performance while minimizing noise generation.
Latest Patents
Sato's latest patents include a foreign matter removing apparatus at a track branch and a nozzle used in the same. The foreign matter removing apparatus is designed to effectively secure foreign matter removal performance while significantly reducing noise. The nozzle for this apparatus injects compressed air from piping through slits formed in each nozzle element. A sloped portion at the front end of the nozzle element opposes a tongue rail, optimizing the removal process. Additionally, he has developed an evaluation substrate, defect examination method, and defect detection device for evaluating foreign object defects in organic materials. This invention includes a substrate with a first film and a second film, designed to enhance defect detection capabilities.
Career Highlights
Masafumi Sato has worked with prominent companies such as Dai Nippon Printing Co., Ltd. and Nabtesco Corporation. His experience in these organizations has contributed to his expertise in developing innovative solutions in his field.
Collaborations
Sato has collaborated with notable coworkers, including Shinji Maekawa and Takanori Sekihara. Their combined efforts have further advanced the technology in which Sato specializes.
Conclusion
Masafumi Sato's contributions to foreign matter removal technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in this field and provide effective solutions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
