This inventor holds 22 USPTO granted patents and 2 published patent applications, primarily in Magnetic Recording Media. Top assignees: Hoya Corporation, Hoya Magnetics Singapore Pte. Ltd., Wd Media (Singapore) Pte. Ltd.. Active years: 2005-2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Singapore, SG (2005 - 2015)
- Tokyo, JP (2016 - 2018)
Company Filing History:
11 out of 2,566 
10 out of 13 
10 out of 73 Years Active: 2005-2018
Areas of Expertise:
Title: Innovations by Masafumi Ishiyama: A Leader in Mask Technology
Introduction
Masafumi Ishiyama, a distinguished inventor based in Singapore, has made significant contributions to the field of mask technology. With a remarkable portfolio of 22 patents, Ishiyama has consistently pushed the boundaries of innovation in the semiconductor industry.
Latest Patents
Among his groundbreaking patents, one notable invention is a mask blank and transfer mask. This innovation features a thin film designed for transfer pattern formation on a transparent substrate. The thin film is composed of materials that include a transition metal and silicon, and also encompass oxygen and nitrogen. A unique aspect of this invention is its oxide layer, which has a higher oxygen content than the underlying thin film, specifically in the surface region. Additionally, the design of the thin film ensures that the thickness is greater on the outer periphery compared to the central portion, enhancing the overall efficacy of the mask blank in various applications.
Career Highlights
Ishiyama's expertise has been honed through his experiences at reputable organizations such as Hoya Corporation and Hoya Magnetics Singapore Pte. Ltd. His tenure at these companies has provided him with the opportunity to develop technologies that significantly impact the manufacturing processes in the semiconductor sector.
Collaborations
Throughout his career, Ishiyama has collaborated with esteemed colleagues, including Teiichiro Umezawa and Kenji Ayama. These partnerships have facilitated a dynamic exchange of ideas and advancements, further contributing to the innovative direction of mask technology.
Conclusion
Masafumi Ishiyama's dedication to innovation and his extensive patent portfolio underscore his role as a pivotal figure in the development of mask technology. His contributions not only advance industrial practices but also inspire future generations of inventors in the field. As technology continues to evolve, Ishiyama's work remains a testament to the importance of creativity and collaboration in driving progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile