Fukushima, Japan

Masafumi Honma

This inventor holds 1 USPTO granted patent. Top assignee: Panasonic Intellectual Property Managment Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masafumi Honma. Retrieved from https://idiyas.com/inventor/masafumi-honma-su7279e3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Masafumi Honma: Innovator in Resin Composition Technology

Introduction

Masafumi Honma is a notable inventor based in Fukushima, Japan. He has made significant contributions to the field of resin compositions, particularly in the development of materials used in various applications.

Latest Patents

Honma holds a patent for a resin composition that includes a curable resin, an acrylic-monomer copolymer, and specific inorganic fillers. This innovative composition is designed for use in prepregs, films with resin, metal-clad laminates, and printed wiring boards. The patent details a complex structure that enhances the performance and applicability of these materials.

Career Highlights

Masafumi Honma is associated with Panasonic Intellectual Property Management Co., Ltd. His work has been instrumental in advancing the technology surrounding resin compositions, showcasing his expertise and commitment to innovation.

Collaborations

Honma has collaborated with notable colleagues, including Teppei Washio and Ryuji Takahashi. Their combined efforts have contributed to the development of advanced materials and technologies in the industry.

Conclusion

Masafumi Honma's contributions to resin composition technology reflect his innovative spirit and dedication to advancing material science. His patent and collaborations highlight the importance of teamwork in achieving significant technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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