Nagoya, Japan

Masaaki Sakaki

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaaki Sakaki. Retrieved from https://idiyas.com/inventor/masaaki-sakaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 113(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Masaaki Sakaki: Innovator in Laser Marking Technology

Introduction

Masaaki Sakaki is a prominent inventor based in Nagoya, Japan. He is known for his innovative contributions to laser marking technology. With a focus on enhancing the capabilities of marking processes, Sakaki has made significant strides in the field.

Latest Patents

Sakaki holds a patent for a method of laser marking. This method involves providing a pigment layer on the surface of an article where a marking is to be formed. The surface is then irradiated with patterned laser light, which changes the internal molecular structure of the pigment, thereby altering its color. This technique allows for multicolored markings through the careful selection of pigment and laser energy density. He has 1 patent to his name.

Career Highlights

Masaaki Sakaki is associated with Mitsubishi Electric Corporation, where he has been instrumental in developing advanced marking technologies. His work has contributed to the company's reputation as a leader in innovative solutions.

Collaborations

Sakaki has collaborated with Kenkoku Azuma, a fellow innovator, to further enhance the applications of laser marking technology. Their partnership has led to advancements that benefit various industries.

Conclusion

Masaaki Sakaki's contributions to laser marking technology exemplify the spirit of innovation. His patented method showcases the potential for creativity in industrial applications. Through his work, he continues to influence the future of marking technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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