Nagoya, Japan

Masaaki Ando

This inventor holds 1 USPTO granted patent. Top assignee: Niterra Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaaki Ando. Retrieved from https://idiyas.com/inventor/masaaki-ando-0902v4lz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Masaaki Ando: Innovator in Gas Sensor Technology

Introduction

Masaaki Ando is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of gas sensor technology. His innovative approach has led to the development of a unique gas sensor that addresses wear issues in metal components.

Latest Patents

Masaaki Ando holds a patent for a gas sensor designed to inhibit wear of a metal member that contacts a ceramic-containing member. The gas sensor comprises a first member containing ceramic and a metal member that contacts the first member. Notably, the hardness of the contact part of the metal member is greater than that of a reference part exhibiting the maximum thickness of the metal member. This innovation enhances the durability and efficiency of gas sensors.

Career Highlights

Masaaki Ando is associated with Niterra Co., Ltd., where he continues to push the boundaries of gas sensor technology. His work has been instrumental in advancing the capabilities of sensors used in various applications.

Collaborations

Masaaki collaborates with talented individuals such as Masana Okai and Takehiro Oba. Their combined expertise fosters an environment of innovation and creativity within their projects.

Conclusion

Masaaki Ando's contributions to gas sensor technology exemplify his commitment to innovation and excellence. His work not only enhances the functionality of gas sensors but also sets a benchmark for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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