Huelva, Spain

María Sacristán García

This inventor holds 1 USPTO granted patent. Top assignee: Seabery North America Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: María Sacristán García. Retrieved from https://idiyas.com/inventor/maría-sacristán-garcía

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: María Sacristán García: Innovator in Augmented and Virtual Reality Technologies.

Introduction

María Sacristán García is a prominent inventor based in Huelva, Spain. She has made significant contributions to the field of augmented and virtual reality through her innovative designs and patents. Her work focuses on enhancing user interaction within these immersive environments.

Latest Patents

María holds a patent for a simulation device suitable for use in augmented-reality or virtual-reality environments. This device comprises a rod, one or more markers arranged on the rod, and a touch actuator. The actuator is characterized by encoding means that track the movement of at least one finger of the user along the rod. This invention is particularly useful for simulating techniques related to welding, industrial painting, and various surgical procedures.

Career Highlights

María is currently associated with Seabery North America Inc., where she continues to develop cutting-edge technologies in the realm of augmented and virtual reality. Her dedication to innovation has positioned her as a key player in her field.

Collaborations

One of her notable collaborators is Juan José Chica Barrera, with whom she has worked closely on various projects.

Conclusion

María Sacristán García's contributions to augmented and virtual reality technologies exemplify her commitment to innovation and excellence. Her patent and ongoing work continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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