Company Filing History:
Years Active: 2002-2005
Title: Innovations by Mary Richey
Introduction
Mary Richey is an accomplished inventor based in Santa Clara, CA (US). She has made significant contributions to the field of photolithography through her innovative patents. With a total of 3 patents, Richey has established herself as a key figure in her area of expertise.
Latest Patents
One of her latest patents focuses on absorbing compounds for spin-on-glass anti-reflective coatings for photolithography. This invention involves an absorbing ether-like compound that includes a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage. This organic light-absorbing compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. The method of synthesizing these light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. Additionally, a method of making absorbing spin-on-glass materials that include the absorbing ether-like compounds is also provided.
Career Highlights
Mary Richey is currently employed at Honeywell International Inc., where she continues to develop innovative solutions in her field. Her work has garnered attention for its practical applications in advanced technologies.
Collaborations
Some of her notable coworkers include Teresa Baldwin and James S Drage. Their collaborative efforts contribute to the innovative environment at Honeywell International Inc.
Conclusion
Mary Richey is a pioneering inventor whose work in photolithography has led to significant advancements in the industry. Her contributions continue to influence the development of new technologies.