The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2005
Filed:
Apr. 30, 2003
Teresa Baldwin, Fremont, CA (US);
Mary Richey, Santa Clara, CA (US);
James S. Drage, Fremont, CA (US);
Hui-jung Wu, Fremont, CA (US);
Richard Spear, San Jose, CA (US);
Teresa Baldwin, Fremont, CA (US);
Mary Richey, Santa Clara, CA (US);
James S. Drage, Fremont, CA (US);
Hui-Jung Wu, Fremont, CA (US);
Richard Spear, San Jose, CA (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.