This inventor holds 1 USPTO granted patent. Top assignee: Rockwell International Corporation. Active years: 1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1995
Title: Mary K Szwed: Innovator in Thin Film Transfer Technology
Introduction
Mary K Szwed is a notable inventor based in Huntington Beach, CA (US). She has made significant contributions to the field of semiconductor technology, particularly in the area of thin film transfer methods. Her innovative approach has led to advancements that benefit various applications in electronics.
Latest Patents
Mary K Szwed holds a patent for a "Method of transferring a thin film to an alternate substrate." This patent describes a process for transferring a thin film of arbitrarily large area from an original substrate to an alternate substrate. The method involves an etch stop layer provided below an epitaxial layer, which is grown on a semiconductor substrate. In a single transfer process, the epitaxial layer is bonded to a rigid host substrate with desirable properties. The original growth substrate is then removed using the etch stop layer. Additionally, a double transfer process is described, where the epitaxial layer is first bonded to a temporary substrate before being transferred to the host substrate.
Career Highlights
Mary K Szwed is associated with Rockwell International Corporation, where she has been able to apply her expertise in semiconductor technology. Her work has been instrumental in developing methods that enhance the efficiency and effectiveness of thin film transfers.
Collaborations
Some of her notable coworkers include Gerard J Sullivan and Mau-Chung Frank Chang. Their collaborative efforts have contributed to the advancement of technology in their respective fields.
Conclusion
Mary K Szwed's innovative work in thin film transfer technology exemplifies her commitment to advancing semiconductor applications. Her contributions continue to influence the industry and pave the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
