Veldhoven, Netherlands

Martinus A Van Den Brink


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 79(Granted Patents)


Company Filing History:


Years Active: 1988

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1 patent (USPTO):Explore Patents

Title: Innovations of Martinus A Van Den Brink

Introduction

Martinus A Van Den Brink is an accomplished inventor based in Veldhoven, Netherlands. With a strong background in alignment technologies, he has made significant contributions to the field of lithography. His innovative approach has led to the development of a unique method for aligning a mask and a substrate, which is critical for precision in manufacturing processes.

Latest Patents

Martinus holds one patent titled "Method of aligning a mask and a substrate relative to each other." This invention encompasses a method and an arrangement for aligning a mask pattern and a substrate, both of which are equipped with two alignment marks. By employing two separate alignment systems, each linked to specific mask marks, the substrate and mask can be accurately aligned without dependency on the exposure apparatus's frame. This methodology not only improves alignment accuracy but also facilitates the detection of magnification errors, enhancing the overall manufacturing process.

Career Highlights

Martinus has an impressive career, having worked with notable companies, including U.S. Philips Corporation and ASML Lithography. His expertise in lithography and alignment systems has played a crucial role in advancing technologies within these organizations. His dedication to innovation is evident from his contributions and the patents he has secured throughout his career.

Collaborations

Throughout his professional journey, Martinus has collaborated with talented individuals, including his coworker Jan Van Eijk. Such partnerships have fostered an environment of creativity and innovation, enabling the development of breakthrough technologies in the field of lithography.

Conclusion

Martinus A Van Den Brink remains a key figure in the realm of innovation, particularly in alignment methodologies pivotal to lithography. His patented inventions and collaborations reflect his commitment to advancing technology and improving manufacturing processes. As innovations continue to evolve in the field, Martinus's work serves as a foundation for future developments.

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