Saint Medard en Jalles, France

Martine Cadre

This inventor holds 1 USPTO granted patent. Top assignee: Aerospatiale Societe Nationale Industrielle. Active years: 1997.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Martine Cadre: Innovator in Plasma Technology

Introduction

Martine Cadre is a notable inventor based in Saint Medard en Jalles, France. He has made significant contributions to the field of plasma technology, particularly with his innovative approach to chemical substance decomposition.

Latest Patents

Martine Cadre holds a patent for a DC arc plasma torch, which is designed for obtaining a chemical substance by decomposition. This invention focuses on utilizing a plasma-generating gas that includes the desired substance. The design features an electrode that communicates with a chamber for injecting the plasma-generating gas through a tubular piece. This setup allows the electric arc to pass through and create a reaction chamber where the plasma is generated. Additionally, the invention includes means to form a fluid barrier between the electrode and the plasma, enhancing the efficiency of the process.

Career Highlights

Martine Cadre is associated with Aerospatiale Société Nationale Industrielle, where he has applied his expertise in plasma technology. His work has contributed to advancements in various applications, showcasing his commitment to innovation in the aerospace and industrial sectors.

Collaborations

Martine collaborates with Maxime Labrot, working together to further their research and development efforts in plasma technology.

Conclusion

Martine Cadre's contributions to the field of plasma technology, particularly through his patented DC arc plasma torch, highlight his innovative spirit and dedication to advancing chemical processing techniques. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
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