Danbury, CT, United States of America

Martin Wusik

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2015-2023

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7 patents (USPTO):

Title: The Innovative Contributions of Martin Wusik

Introduction

Martin Wusik is a notable inventor based in Danbury, CT (US), recognized for his significant contributions to the field of materials science. With a total of seven patents to his name, Wusik has made strides in developing advanced chemical compositions that enhance the properties of various materials.

Latest Patents

Wusik's latest patents include the development of reactive poly(fluoroalkyl-functional siloxane) oligomers. These oligomers are derived from hydrolysable fluoroalkyl-functional silanes and are designed to form coatings or films on substrates, imparting hydrophobic and oleophobic properties. His work demonstrates that these reactive poly(fluoroalkyl-functional siloxane) oligomers exhibit superior chemical resistance compared to traditional hydrolysable fluoroalkyl-functional silanes. Additionally, he has developed reactive compositions containing mercapto-functional silicon compounds, which involve a mercapto-functional silicon compound and a reactive resin with epoxy and/or (meth)acrylate groups.

Career Highlights

Wusik is currently employed at Momentive Performance Materials GmbH, where he continues to innovate and contribute to the field of materials science. His work focuses on creating advanced materials that meet the evolving needs of various industries.

Collaborations

Some of Wusik's notable coworkers include Vikram Kumar and Constantine Kondos, who collaborate with him on various projects within the company.

Conclusion

Martin Wusik's innovative work in developing reactive poly(fluoroalkyl-functional siloxane) oligomers and other advanced materials showcases his expertise and commitment to enhancing material properties. His contributions are significant in the field of materials science and continue to influence various applications.

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