Martin Tanner

Title: Martin Tanner: Innovator in Plasma Technology

Introduction

Martin Tanner is a notable inventor based in Bern, Switzerland. He has made significant contributions to the field of plasma technology, holding a total of 3 patents. His work focuses on innovative solutions for ionization and mass spectrometry.

Latest Patents

One of his latest patents is the "Microwave Driven Plasma Ion Source." This invention relates to a microwave-driven plasma ion source designed for ionizing samples into sample ions. The device includes a sample intake for inserting the sample, a microwave generator for generating plasma from a plasma gas, and a plasma torch that houses the processes of plasma generation and sample ionization. The design also features a shielding mechanism to prevent microwaves from escaping while allowing plasma and sample ions to exit through a torch outlet.

Another significant patent is the "Apparatus and Method for Mass Spectrometry." This apparatus comprises a portion generator that creates localized analyte portions in synchronization with trigger pulses. It includes a transfer system for transporting these portions, a plasma ionizer unit for atomizing and ionizing the analytes, and a mass analyzer for analyzing the received portions. The system is equipped with a signal delay device to account for delays experienced by particles between generation and detection.

Career Highlights

Martin Tanner is currently employed at Tofwerk AG, a company known for its advancements in mass spectrometry and plasma technology. His innovative work has positioned him as a key figure in the development of new technologies in these fields.

Collaborations

He collaborates with notable coworkers, including Marc Gonin and Christian Tanner, who contribute to his projects and innovations.

Conclusion

Martin Tanner's contributions to plasma technology and mass spectrometry highlight his role as a leading inventor in these fields. His patents reflect a commitment to advancing scientific understanding and technological capabilities.