Martin Süss

Title: Martin Süss: Innovator in Semiconductor Technology

Introduction

Martin Süss is a prominent inventor based in Zurich, Switzerland. He is known for his contributions to semiconductor technology, particularly in the area of tensile strain states in semiconductor components. His innovative approach has led to significant advancements in the field.

Latest Patents

Martin Süss holds a patent for a semiconductor component comprising micro-bridges for adjusting a tensile strain state and the method for its production. This patent describes a process where a pretensioned layer is applied to a substrate. Bridge structures are introduced in the layers through lithography and etching. The bridges are connected to the layer on both sides, ensuring continuity. The geometric shape of the bridges is determined by the windows in the layer. When the substrate is selectively etched, the bridge is undercut through these windows. This geometric structuring causes a redistribution of the originally homogeneous strain when the bridges detach from the substrate. The larger cross-sections relax at the expense of the smaller ones, increasing the pretension. The multiplication of stresses originally present in the sample is determined by the relationships of lengths, widths, and depths.

Career Highlights

Throughout his career, Martin Süss has worked with esteemed institutions such as the Paul Scherrer Institute and ETH Zurich. His work has significantly impacted the semiconductor industry, showcasing his expertise and innovative thinking.

Collaborations

Martin has collaborated with notable colleagues, including Jerome Faist and Gustav Schiefler. These collaborations have further enriched his research and contributions to the field.

Conclusion

Martin Süss is a key figure in semiconductor innovation, with a focus on enhancing the performance of semiconductor components through his patented technologies. His work continues to influence the industry and inspire future advancements.