Chur, Switzerland

Martin Suetterlin

This inventor holds 1 USPTO granted patent. Top assignee: Ems-Patent Ag. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin Suetterlin. Retrieved from https://idiyas.com/inventor/martin-suetterlin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Martin Suetterlin: Innovator in Polyamide Moulding Materials

Introduction

Martin Suetterlin is a notable inventor based in Chur, Switzerland. He has made significant contributions to the field of materials science, particularly in the development of polyamide moulding materials. His innovative work has led to the creation of a unique transparent polyamide molding material that incorporates cycloolefin copolymers.

Latest Patents

Martin Suetterlin holds a patent for "Polyamide moulding materials containing cycloolefin copolymers." This patent describes a transparent polyamide molding material that consists of a mixture of specific components, showcasing his expertise in material formulation. He has 1 patent to his name, reflecting his commitment to advancing technology in this area.

Career Highlights

Suetterlin is associated with Ems-Patent AG, a company known for its focus on innovative polymer solutions. His role at the company has allowed him to explore and develop new materials that meet the evolving needs of various industries. His work has positioned him as a key player in the field of polymer science.

Collaborations

Throughout his career, Martin has collaborated with esteemed colleagues such as Botho Hoffmann and Sepp Bass. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Martin Suetterlin's contributions to the field of polyamide moulding materials highlight his innovative spirit and dedication to advancing material science. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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