Company Filing History:
Years Active: 1999
Title: Martin Straub: Innovator in Reactive Ion Etching Technologies
Introduction
Martin Straub is a notable inventor based in Munich, Germany. He has made significant contributions to the field of materials science, particularly in the area of reactive ion etching. With a total of 2 patents, his work has advanced the technology used in various applications, including magnetic recording.
Latest Patents
One of Martin's latest patents is titled "Reactive ion etching of alumina/TiC substrates." This invention presents a method for patterning the air bearing surface of a ceramic slider, which preferably includes alumina and titanium carbide. The method involves forming an etch pattern by depositing and developing a photoresist on the ceramic slider. It also includes reactive ion etching the slider air bearing surface using an etchant gas composed of argon, sulfur hexafluoride, and methyltrifluoride. This process ensures a smooth patterned surface on the slider air bearing surface.
Another significant patent is the "Process of surface modification of magnetic heads by a reactive gas." This process describes the modification of the outermost atomic layer of a substrate, such as a carbon layer with hydrogen atoms bonded at the surface, in a plasma chamber. The goal is to covalently bond carbon-fluorine groups, such as CF₃ groups, to the carbon atoms in the surface. By establishing a plasma process that allows both etching and deposition, a fluorinated gas is injected into the chamber to facilitate the bonding of CF₃ groups. This innovative process enhances the surface properties, providing high affinity for lubricants and low affinity for contaminants, making it particularly useful for heads and disks in magnetic recording.
Career Highlights
Martin Straub is currently employed at the International Business Machines Corporation (IBM), where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of reactive ion etching, which is crucial for various high-tech applications.
Collaborations
Throughout his career, Martin has collaborated with talented individuals such as Son Van Nguyen and Diana Perez. These partnerships have contributed to the successful development of his innovative technologies.
Conclusion
Martin Straub is a distinguished inventor whose work in reactive ion etching has made a significant impact in the field of materials science. His patents reflect his commitment to innovation and excellence in technology.