The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Jun. 04, 1997
International Business Machines Corporation, Armonk, NY (US);
Abstract
A process is described for the modification of the outermost atomic layer of a substrate, such as a carbon layer having hydrogen atoms bonded at the surface, in a plasma chamber to covalently bond carbon-flourine groups such as CF.sub.3 groups to carbon atoms in the surface. After establishing a plasma process in which both etching and deposition are ocurring, a fluorinated gas is injected into the chamber to allow CF.sub.3 groups to bond to the surface. The process does not apply of a layer with a defined thickness, but rather conditions the surface for desired properties of high affinity for lubricants and low affinity for contaminants. The invention is particularly useful for heads and disks for use in magnetic recording.