Company Filing History:
Years Active: 1996-1999
Title: Martin Nonnenmacher: A Pioneer in Profilometry Innovations
Introduction
Martin Nonnenmacher was a notable inventor known for his contributions to the field of profilometry. He was based in Schoenaich, Germany, and held a total of 4 patents during his career. His work primarily focused on developing calibration standards that significantly advanced measurement techniques in nanotechnology.
Latest Patents
One of Nonnenmacher's latest patents is a calibration standard for 2-D and 3-D profilometry in the sub-nanometer range. This calibration standard comprises a supporting structure made of single crystal material, featuring at least one pair of different kinds of structures, including a raised line and a trench. These structures have identical widths in the range of about 500 nm, with silicon being the preferred material. The method of producing this calibration standard involves several steps, including bonding polished wafers and selectively etching to create the desired structures. This innovation addresses the challenges of measuring the diameter of ultrafine tips used in Atomic Force Microscopy (AFM) and Scanning Tunneling Microscopy (STM) profilometry.
Career Highlights
Throughout his career, Nonnenmacher made significant strides in the field of nanotechnology. His work at International Business Machines Corporation (IBM) allowed him to collaborate with other talented individuals and contribute to groundbreaking advancements in measurement techniques.
Collaborations
Some of Nonnenmacher's notable coworkers included Thomas Bayer and Johann Greschner. Their collaborative efforts helped to enhance the quality and impact of their research in the field.
Conclusion
Martin Nonnenmacher's contributions to profilometry and nanotechnology have left a lasting legacy in the scientific community. His innovative patents and collaborative spirit continue to inspire future generations of inventors and researchers.
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