Company Filing History:
Years Active: 1994
Title: Martin Moreau: Innovator in Polymeric Dyes
Introduction
Martin Moreau is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of polymeric dyes, particularly in their application for antireflective coatings. His innovative work has implications for various industries, including photolithography and materials science.
Latest Patents
Martin Moreau holds 1 patent for his invention titled "Polymeric dyes for antireflective coatings." This patent describes a composition and methods for the use and manufacture of a polymeric dye. The composition includes one or more aminoaromatic chromophores combined with polymers that have an anhydride group or their reaction products. This innovative composition is particularly useful as an underlaying antireflective coating with microlithographic photoresists, enhancing the absorption of near or deep ultraviolet radiation.
Career Highlights
Martin Moreau is associated with the International Business Machines Corporation (IBM), where he has contributed to various research and development projects. His work at IBM has allowed him to explore the practical applications of his inventions in real-world scenarios, further advancing the field of polymeric materials.
Collaborations
Throughout his career, Martin has collaborated with notable colleagues, including Christopher John Knors and Elwood Herbert Macy. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Martin Moreau's contributions to the field of polymeric dyes and antireflective coatings exemplify the impact of innovative thinking in technology. His work continues to influence advancements in materials science and photolithography.