Prenzlau, Germany

Martin Mack

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Autarq Gmbh. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin Mack. Retrieved from https://idiyas.com/inventor/martin-mack-2nzunplm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Martin Mack - Innovator in Solar Roof Technology

Introduction

Martin Mack is a notable inventor based in Prenzlau, Germany. He has made significant contributions to the field of solar energy through his innovative designs and patents. His work focuses on creating efficient and cost-effective solutions for solar roof systems.

Latest Patents

Martin Mack holds a patent for a roof covering element, specifically a solar roof covering element, along with an assembly of solar roof covering elements and a method for producing such elements. The patent describes a roof covering element designed for solar roof systems that can be produced through a cost-effective mass production process. This invention enables simple and economical roof mounting, making solar energy more accessible.

Career Highlights

Throughout his career, Martin has demonstrated a commitment to advancing solar technology. His patent reflects his innovative approach to integrating solar modules into roofing systems, which is crucial for promoting renewable energy solutions.

Collaborations

Martin collaborates with talented individuals such as Cornelius Paul and Dieter Neberg, who contribute to the development and implementation of his innovative ideas.

Conclusion

Martin Mack's contributions to solar roof technology exemplify the potential of innovation in renewable energy. His work not only enhances the efficiency of solar systems but also promotes sustainable practices in construction.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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