This inventor holds 2 USPTO granted patents. Top assignee: Sefar Ag. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Martin Lehner: Innovator in Screen Printing Technology
Introduction
Martin Lehner is a notable inventor based in Engelburg, Switzerland. He has made significant contributions to the field of screen printing technology. With a focus on innovative methods and materials, Lehner has secured a total of 2 patents that showcase his expertise and creativity.
Latest Patents
Lehner's latest patents include a method to produce a fabric strip, particularly for a screen printing form, and a fabric specifically designed for screen printing. The first patent describes a process where a plastic cloth is prepared with a metallic casing layer on both sides through techniques such as vapor deposition, plasma spraying, or cathode sputtering. This material is then galvanically coated with a metal layer. The second patent focuses on a screen printing fabric made from self-crossing plastic threads, which are coated with a vacuum metallized or sputtered encasing layer. This layer is further enhanced by an emulsion-bearing metal coating produced through electroplating.
Career Highlights
Lehner has built a career centered around innovation in materials and processes for screen printing. His work has not only advanced the technology but has also provided practical solutions for various applications in the industry.
Collaborations
Throughout his career, Martin Lehner has collaborated with notable colleagues, including Christian Schilling and Horst Baumann. These partnerships have contributed to the development and refinement of his inventions.
Conclusion
Martin Lehner stands out as a key figure in the realm of screen printing technology. His innovative patents reflect his commitment to advancing the industry and improving the quality of screen printing materials. His contributions will continue to influence the field for years to come.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile