Martin Jurna

Title: Martin Jurna - Innovator in Nonlinear Optics

Introduction

Martin Jurna is a notable inventor based in Hengelo, Netherlands. He has made significant contributions to the field of nonlinear optics, particularly through his innovative methods and optical arrangements. His work has implications for various applications in photonics and material science.

Latest Patents

Martin Jurna holds a patent for a method and optical arrangement for generating a nonlinear optical signal on a material that is excited by an excitation field. This patent describes a process where coherent fields of first and second optical pulses of differing frequencies are overlapped in the material in both temporal and spatial relationships. The first pulses of a first frequency are generated in a first beam from a first optical generator unit, while the second pulses are produced in a second beam from a second optical generator unit that is synchronously pumped by the first unit. This innovative approach allows for the generation of higher harmonic frequency pulses, enhancing the capabilities of optical signal generation.

Career Highlights

Martin Jurna is associated with A·p·e Angewandte Physik & Elektronik GmbH, where he continues to advance his research and development in optics. His work has positioned him as a key figure in the field, contributing to the understanding and application of nonlinear optical phenomena.

Collaborations

Martin has collaborated with notable colleagues such as Ingo Rimke and Cees Otto. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the realm of applied physics and electronics.

Conclusion

Martin Jurna's contributions to nonlinear optics through his patented methods and collaborations highlight his role as an influential inventor in the field. His work continues to inspire advancements in optical technologies and applications.