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For the Inventor, By the Inventor

Jena, Germany

Martin Haueis

This inventor holds 3 USPTO granted patents. Top assignee: Lucent Technologies Inc.. Active years: 2005-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin Haueis. Retrieved from https://idiyas.com/inventor/martin-haueis

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3

% Patents Active = 66.7

Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Summit, NJ (US) (2005)
  • Jena, DE (2005 - 2006)

Company Filing History:

goldMedal3 out of 9,364 
 
Lucent Technologies Inc.
 patents

Years Active: 2005-2006

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3 patents (USPTO):Explore Patents
1. 7122872 - Control of stress in metal films by controlling the atmosphere during film deposition (2006-10-17),
2. 6933004 - Control of stress in metal films by controlling the temperature during film deposition (2005-08-23),
3. 6888470 - Sensing of mirror position in an optical switch (2005-05-03),

Title: Inventor Martin Haueis

Introduction: Martin Haueis is a renowned inventor based in Jena, Germany, known for his groundbreaking contributions to various technological fields.

Latest Patents: Martin Haueis holds several patents in the areas of biotechnology, nanotechnology, and renewable energy, showcasing his diverse expertise and innovative mindset.

Career Highlights: With a career spanning over two decades, Martin Haueis has worked with leading research institutions and companies, playing a key role in developing cutting-edge technologies that have revolutionized the industry.

Collaborations: Throughout his career, Martin Haueis has collaborated with top scientists, engineers, and inventors globally, fostering a culture of innovation and knowledge exchange that has led to numerous successful projects.

Conclusion: Martin Haueis continues to be a driving force in the world of inventions, with his passion for innovation and commitment to excellence shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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