Company Filing History:
Years Active: 2005
Title: Martin Fürfanger: Innovator in Semiconductor Technology
Introduction
Martin Fürfanger is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor wafer that enhances performance and efficiency.
Latest Patents
Martin Fürfanger holds a patent for an "Epitaxially coated semiconductor wafer and process for producing it." This patent describes a semiconductor wafer featuring a front surface and a back surface, with an epitaxial layer of semiconducting material deposited on the front surface. The epitaxial layer boasts a maximum local flatness value SFQR of less than or equal to 0.13 µm and a maximum density of 0.14 scattered light centers per cm. The front surface of the wafer, prior to the deposition of the epitaxial layer, has a surface roughness of 0.05 to 0.29 nm RMS, measured by AFM on a 1 µm×1 µm reference area. The process for producing this semiconductor wafer includes several steps, such as simultaneous polishing of both surfaces and the deposition of the epitaxial layer.
Career Highlights
Martin Fürfanger is currently employed at Siltronic AG, a leading company in the semiconductor industry. His work at Siltronic AG has allowed him to focus on advancing semiconductor technologies and improving manufacturing processes. His innovative approach has positioned him as a key player in the field.
Collaborations
Martin has collaborated with notable colleagues, including Guido Wenski and Wolfgang Siebert. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a productive working environment.
Conclusion
Martin Fürfanger's contributions to semiconductor technology through his innovative patent and work at Siltronic AG highlight his importance in the field. His dedication to improving semiconductor manufacturing processes continues to influence the industry positively.