Munich, Germany

Martin Enderlein

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Toptica Photonics Ag. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin Enderlein. Retrieved from https://idiyas.com/inventor/martin-enderlein

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Martin Enderlein: Innovator in Optical Resonators

Introduction

Martin Enderlein is a notable inventor based in Munich, Germany. He has made significant contributions to the field of optical resonators, particularly through his innovative methods for modulating resonant frequencies.

Latest Patents

Enderlein holds a patent for a method titled "Fast modulation of the resonant frequency of an optical resonator." This invention relates to a technique for modulating the resonant frequency of an optical resonator in accordance with a periodic modulation signal. The goal is to enable fast modulation, allowing the current resonant frequency to follow the modulation signal as accurately as possible, particularly at fundamental frequencies in the kHz range.

Career Highlights

Martin Enderlein is associated with Toptica Photonics AG, a company known for its advancements in photonics technology. His work has been instrumental in enhancing the performance of optical devices.

Collaborations

Enderlein has collaborated with notable colleagues, including Manfred Hager and Thomas A. Puppe, contributing to the advancement of optical technologies.

Conclusion

Martin Enderlein's innovative work in optical resonators exemplifies the impact of dedicated inventors in advancing technology. His contributions continue to influence the field significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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