Carmel, NY, United States of America

Martin Emery Beahm

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin Emery Beahm. Retrieved from https://idiyas.com/inventor/martin-emery-beahm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 131(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Martin Emery Beahm: Innovator in VLSI Circuit Design

Introduction

Martin Emery Beahm is a notable inventor based in Carmel, NY (US). He has made significant contributions to the field of Very Large Scale Integration (VLSI) circuit design. His innovative work has led to the development of a patented technology that enhances the efficiency of circuit layouts.

Latest Patents

Martin Beahm holds a patent for "Parameterized cells for generating dense layouts of VLSI circuits." This invention provides a technique for automatically producing a layout for each device in a circuit, based on a netlist that describes the terminal connections and the dimensions of each device. This advancement is crucial for optimizing circuit design and improving overall performance.

Career Highlights

Beahm is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects in the realm of circuit design and technology. His expertise in VLSI circuits has positioned him as a valuable asset within the company.

Collaborations

Throughout his career, Martin has collaborated with esteemed colleagues such as Terry I Chappell and Rajiv V Joshi. These partnerships have fostered innovation and have led to advancements in the field of circuit design.

Conclusion

Martin Emery Beahm's contributions to VLSI circuit design through his patented technology exemplify his commitment to innovation. His work continues to influence the industry and pave the way for future advancements in circuit layout techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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