Tequesta, FL, United States of America

Martin A Blumenfeld

This inventor holds 3 USPTO granted patents. Top assignee: Rca Inc.. Active years: 1983-1987.


% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 3

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 1983-1987

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3 patents (USPTO):Explore Patents

Title: Martin A Blumenfeld: Innovator in Semiconductor Technology

Introduction

Martin A Blumenfeld is a notable inventor based in Tequesta, Florida. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on methods that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Blumenfeld's latest patents include a method for planarizing multilayer semiconductor devices. This innovative method involves forming an insulating layer over a substrate surface with raised portions, ensuring that the insulating layer conforms to the topography of the substrate. Another significant patent is the low temperature elevated pressure glass flow/re-flow process, which reduces the time and temperature required for flowing or re-flowing a glass layer on a semiconductor device by conducting the process at elevated pressure.

Career Highlights

Martin A Blumenfeld has had a distinguished career, working at RCA Inc., where he has been able to apply his innovative ideas in practical settings. His patents reflect a deep understanding of semiconductor technology and a commitment to advancing the field.

Collaborations

Throughout his career, Blumenfeld has collaborated with notable colleagues, including Thomas F Bibby, Jr and Chung W Leung. These collaborations have likely contributed to the development of his innovative patents and advancements in semiconductor technology.

Conclusion

Martin A Blumenfeld is a prominent figure in the semiconductor industry, recognized for his innovative patents and contributions to technology. His work continues to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
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