Ghent, Belgium

Martijn Courteaux

This inventor holds 1 USPTO granted patent. Top assignees: Imec Vzw, Universiteit Gent. Active years: 2026.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Martijn Courteaux: Innovator in Light Field Rendering

Introduction

Martijn Courteaux is a notable inventor based in Ghent, Belgium. He has made significant contributions to the field of light field rendering, showcasing his innovative approach through his patented technology. His work is characterized by a deep understanding of complex models and their applications in imaging.

Latest Patents

Martijn Courteaux holds a patent for a method of light field rendering. This method involves obtaining an n-dimensional mixture model, where n is a natural number equal to or larger than 4, of a light field. The model consists of kernels, each representing light information expressed by parameter values. The process includes mathematically reducing the n-dimensional mixture model into a 2-dimensional mixture model of an image from a specific point of view. The 2-dimensional model is also composed of kernels, allowing for the rendering of a view in a pixel domain from this model.

Career Highlights

Throughout his career, Courteaux has worked with prominent organizations such as Imec Vzw and Universiteit Gent. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in light field technology.

Collaborations

Some of his notable coworkers include Glenn Van Wallendael and Peter Lambert. Their collaboration has likely fostered an environment of innovation and creativity, further enhancing the impact of their work in the field.

Conclusion

Martijn Courteaux is a distinguished inventor whose work in light field rendering exemplifies the intersection of technology and creativity. His contributions continue to influence advancements in imaging and rendering techniques.

Profile summary based on public USPTO records.
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