Girona, Spain

Marti Maria Saquer

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marti Maria Saquer. Retrieved from https://idiyas.com/inventor/marti-maria-saquer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Marti Maria Saquer: Inventor in Image-Modification Detection

Introduction

Marti Maria Saquer is an inventor associated with Girona, Spain, and Hewlett-Packard Development Company, L.P. His patent work addresses how to determine whether an image has undergone spatial adjustments.

Latest Patents

Saquer is associated with 1 patent, titled “Method and System to Determine Whether an Image Includes Spatial Adjustments.” The disclosed computer-implemented method compares an original image with an adjusted image. It identifies pixels in the original image that share the same color value, then checks whether the spatially corresponding pixels in the adjusted image also share a single color value. If they do not, the method identifies a spatial adjustment.

Career Highlights

Saquer’s listed invention focuses on detecting spatial modifications by comparing corresponding pixel groups across two images. This approach provides a way to identify changes that may not be apparent from a simple comparison of the images as a whole.

Collaborations

His listed coworkers include Jordi Arnabat Benedicto and Peter Morovic. The patent is associated with Hewlett-Packard Development Company, L.P.

Conclusion

Marti Maria Saquer’s patent work centers on a method for identifying spatial image adjustments through pixel-level comparison.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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