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For the Inventor, By the Inventor

Dedham, MA, United States of America

Martha M Rajaratnam

This inventor holds 5 USPTO granted patents. Top assignee: Shipley Company LLC. Active years: 1993-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martha M Rajaratnam. Retrieved from https://idiyas.com/inventor/martha-m-rajaratnam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5

% Patents Active = 100.0

Average Co-Inventor Count = 4.5

ph-index = 5

Forward Citations = 146(Granted Patents)


Company Filing History:

goldMedal5 out of 522 
 
Shipley Company LLC
 patents

Years Active: 1993-2000

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5 patents (USPTO):Explore Patents
1. 6048672 - Photoresist compositions and methods and articles of manufacture (2000-04-11),
2. 5731364 - Photoimageable compositions comprising multiple arylsulfonium (1998-03-24),
3. 5362600 - Radiation sensitive compositions comprising polymer having acid labile (1994-11-08),
4. 5344742 - Benzyl-substituted photoactive compounds and photoresist compositions (1994-09-06),
5. 5258257 - Radiation sensitive compositions comprising polymer having acid labile (1993-11-02),

Title: Innovations of Martha M Rajaratnam

Introduction

Martha M Rajaratnam is a prominent inventor based in Dedham, MA (US). She has made significant contributions to the field of photoresist compositions, holding a total of five patents. Her work has advanced the technology used in photolithography, which is essential for semiconductor manufacturing.

Latest Patents

Martha's latest patents include innovative developments in photoresist compositions and methods. One notable invention is a positive chemically amplified photoresist composition that produces a strong photogenerated acid. This resist is coated onto a metal substrate that has undergone a stringent bake step, specifically heating the substrate to at least 140 degrees Celsius for more than 60 seconds. The combination of a strong photogenerated acid and a stringent pre-coating substrate bake results in highly resolved resist relief images, even on metal substrates. Another significant patent involves photoimageable compositions comprising multiple arylsulfonium compounds. This invention provides both positive- and negative-acting photoresist compositions that include a photoacid generator component with multiple aryl sulfonium compounds. The photoactive component can be conveniently prepared and offers a deep UV sensitive resist with excellent microlithographic properties.

Career Highlights

Martha M Rajaratnam is currently associated with Shipley Company, L.L.C., where she continues to innovate in the field of photoresist technology. Her expertise and contributions have positioned her as a key figure in her industry.

Collaborations

Martha has collaborated with notable coworkers, including Roger F Sinta and James W Thackeray. Their combined efforts have furthered advancements in the technologies they work on.

Conclusion

Martha M Rajaratnam's contributions to the field of photoresist compositions have made a significant impact on the semiconductor industry. Her innovative patents and collaborations highlight her role as a leading inventor in this specialized area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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