Company Filing History:
Years Active: 1994-2009
Title: Innovations by Marshall J Fleming, Jr.
Introduction
Marshall J Fleming, Jr. is a notable inventor based in Underhill, Vermont, who has made significant contributions to the field of semiconductor technology. He holds a total of 3 patents, showcasing his innovative approach to solving complex engineering challenges.
Latest Patents
One of his latest patents is a method to eliminate arsenic contamination in trench capacitors. This invention provides a trench capacitor structure that substantially reduces or essentially eliminates arsenic contamination from diffusing into a semiconductor substrate along the sidewalls of a trench opening with a high aspect ratio. The invention also includes a method for fabricating such a trench capacitor structure and a method for detecting arsenic contamination during the drive-in annealing step. The detection process utilizes the effect of arsenic-enhanced oxidation, where the high-temperature oxidation anneal used to drive arsenic into the semiconductor substrate is monitored for thickness. If large levels of arsenic outdiffusion are detected, the oxidation rate increases, resulting in a thicker oxide layer. This allows for the reworking of products that have undergone the process steps to form the buried plate up to the drive-in anneal, thereby reducing arsenic contamination.
Career Highlights
Marshall J Fleming, Jr. is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in semiconductor technology. His work has had a significant impact on the industry, particularly in improving the reliability and performance of semiconductor devices.
Collaborations
Throughout his career, Fleming has collaborated with notable colleagues, including Mousa H Ishaq and Steven M Shank. These collaborations have further enhanced his research and development efforts, leading to successful innovations in the field.
Conclusion
Marshall J Fleming, Jr. is a distinguished inventor whose work in semiconductor technology has led to important advancements in the industry. His innovative methods for reducing arsenic contamination in trench capacitors demonstrate his commitment to improving manufacturing processes and product quality.