Fuerth, Germany

Markus Von Beyer

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Leonhard Kurz Stiftung & Co Kg. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Von Beyer. Retrieved from https://idiyas.com/inventor/markus-von-beyer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):Explore Patents

Title: Innovations by Markus Von Beyer

Introduction

Markus Von Beyer is a notable inventor based in Fürth, Germany. He has made significant contributions to the field of recycling technology, holding 2 patents that showcase his innovative approach to sustainable practices.

Latest Patents

His latest patents include a method for recycling a transfer product. This method involves at least one carrier film, with a transfer ply arranged detachably at least partially on the carrier film. The process consists of several steps carried out in a specific order to enhance the efficiency of recycling.

Career Highlights

Markus is currently associated with Leonhard Kurz Stiftung & Co. KG, a company known for its advancements in surface technology and decorative finishes. His work there emphasizes the importance of innovation in creating sustainable solutions.

Collaborations

Some of his coworkers include Astrid Rauh and Siegfried Stengel, who contribute to the collaborative environment that fosters creativity and innovation within the company.

Conclusion

Markus Von Beyer exemplifies the spirit of innovation through his patents and contributions to recycling technology. His work not only advances the field but also promotes sustainability in industrial practices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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