Zwolle, Netherlands

Markus R Luesken

This inventor holds 1 USPTO granted patent. Top assignee: Dsm IP Assets B.v.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus R Luesken. Retrieved from https://idiyas.com/inventor/markus-r-luesken

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: The Innovations of Markus R. Luesken

Introduction

Markus R. Luesken is a notable inventor based in Zwolle, Netherlands. He has made significant contributions to the field of resin compositions, showcasing his innovative spirit through his patented inventions. With a focus on creating advanced materials, Luesken's work has implications for various industries.

Latest Patents

Luesken holds a patent for "Lpa hybride," which relates to resin compositions that contain specific components. The invention also encompasses a process for preparing molded articles from these resin compositions, as well as the molded articles themselves. This patent highlights his expertise in material science and engineering.

Career Highlights

Markus R. Luesken is associated with DSM IP Assets B.V., a company known for its commitment to innovation and sustainability. His role at DSM has allowed him to explore and develop new technologies that contribute to the advancement of resin applications.

Collaborations

Throughout his career, Luesken has collaborated with talented individuals such as Adrianus J. De Koning and Peter Dijkink. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking inventions.

Conclusion

Markus R. Luesken's contributions to the field of resin compositions and his innovative patent demonstrate his commitment to advancing material science. His work continues to inspire future innovations in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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