Schwetzingen, Germany

Markus Otremba

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Borgwarner Inc.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Otremba. Retrieved from https://idiyas.com/inventor/markus-otremba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Markus Otremba and His Patent for a Segmented Friction Lining.

Introduction

Markus Otremba is an inventor associated with Schwetzingen, Germany, and BorgWarner Inc. His recorded patent concerns the design and manufacture of segmented friction linings for braking or clutch systems.

Latest Patents

Otremba is associated with 1 patent: “Friction-Lining Segment, Friction Lining and Process for Its Manufacture.” The invention describes a segmented friction lining for a friction plate used in a brake or clutch. One end of each segment has a locking mechanism, while the other has a complementary counter-mechanism. One or more holes near the lock help relieve stress at the junctions along the connecting edges. The holes can be milled into the lining.

Career Highlights

The available information connects Otremba’s work with BorgWarner Inc. His patent focuses on a practical engineering challenge: reducing stress around the interlocking connections in segmented friction linings.

Collaborations

Meike Lenk and Emilio Fabricius are identified as Otremba’s coworkers. The supplied information does not specify their roles or whether they collaborated on the patent.

Conclusion

Markus Otremba’s recorded patent addresses stress relief in interlocking friction-lining segments, reflecting an engineering contribution to brake and clutch component design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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